This paper presents the IEEE International Conference on Multimedia and Expo (ICME) 2026 Grand Challenge on Cross-Scenario Defect Detection and Fine-Grained Severity Grading for High-Precision Manufacturing. The challenge is motivated by two key limitations of existing industrial defect inspection systems: (1) current deep learning-based methods often suffer significant performance degradation when deployed in unseen production scenarios, and (2) most benchmarks neglect severity-aware assessment, which is critical for risk control and yield optimization.
arXiv:2604. 26633v2 Announce Type: replace-cross Abstract: Industrial surface defect inspection suffers from a fundamental data bottleneck: defects are rare, annotations require expert knowledge, and collecting balanced training sets is slow and costly.
By Paul Julius K\"uhn, Mika Pommeranz, Arjan Kuijper, Saptarshi Neil Sinha
arXiv:2608.29783v1 Announce Type: new
Abstract: Industrial anomaly detection is a critical component of modern manufacturing. Most traditional unsupervised methods rely on modelling normal feature di...
By Weifei Chen, Honghao Zhang, Zhiyuan You, Xinyi Le
Despite generating increasingly photorealistic images, text-to-image (T2I) models still exhibit localized, subtle, and structurally complex failures. Diagnosing these failures requires instance-level feedback that answers where a defect occurs, what type it is, why it is defective, and its importance to overall image quality.
The paper introduces a morphology‑aware ambiguity learning framework for wafer defect decision support. It enables three diagnostic actions—automatic single‑class diagnosis, assisted diagnosis with two plausible defect classes, and full review—by constructing a class‑level ambiguity matrix from wafer map characteristics. Experiments on the WM‑811K dataset demonstrate that the framework outperforms traditional methods, offering meaningful two‑class alternatives and reserving full review for truly ambiguous cases, with consistent performance across different backbone architectures.
By Seungjun Chu, Seokhyun Chung
arXiv:2608. 07770v1 Announce Type: new Abstract: Automated anomaly detection methods often report strong performance on curated academic benchmarks, but their behavior under real-world industrial conditions is less clear.
By Mike Szklarzewski, CJ George, Gavin Smithson, Christopher Stokes, Dakota Fulp, William M. Jones, Benjamin Wynn, Alexander Ur, Agit Yesiloz, Clint Kallenbach, Mark Swartz, Nathan DeBardeleben, Sharmistha Chakrabarti
arXiv:2608.20713v1 Announce Type: new
Abstract: Generative AI can now produce highly realistic images, yet current models still exhibit subtle but critical defects that undermine their reliability. W...
By Xiangfei Sheng, Weidong Zou, Tianjiao Gu, Zhichao Yang, Pengfei Chen, Leida Li
arXiv:2606. 25769v1 Announce Type: new Abstract: In many prediction problems in medical applications, target labels exhibit an inherent ordinal structure, where class ordering reflects clinically meaningful severity levels.
By Tal Dvora, Rotem Haba, Gonen Singer
arXiv:2606. 07953v1 Announce Type: new Abstract: Large-scale Visual-Language Models (LVLMs) have achieved remarkable success in natural visual tasks, yet their application to industrial defect detection remains challenging due to two fundamental limitations: (i) the scarcity of large-scale industrial datasets that cover diverse defect categories across multiple domains, and (ii) the reliance on manual prompts (points, boxes, masks) that introduce subjective noise and lack text-visual interaction for fine-grained understanding.
By Zekai Zhang, Jinglin Zhang, Qinghui Chen, Gang Li, Da Chen, Shuainan Jing, He Wang, Dagang Li, Cong Liu, Cong Bai, Shengyong Chen
arXiv:2610.00994v1 Announce Type: new
Abstract: Existing synthetic image evaluators typically provide only a scalar quality score and do not identify the image regions that support it. We introduce V...
By Xianda Du, Max Ku, Weiming Ren, Zhi Rui Tam, Chunlin Ren, Ping Nie, Min-Hung Chen, Wenhu Chen
arXiv:2606. 07965v1 Announce Type: new Abstract: Large Visual Language Models (LVLMs) have achieved remarkable success in vision tasks.
By Zekai Zhang, Qinghui Chen, Maomao Xiong, Shijiao Ding, Zhanzhi Su, Xinjie Yao, Yiming Sun, Cong Bai, Jinglin Zhang
arXiv:2606. 08908v1 Announce Type: cross Abstract: Semiconductor lithography inspection requires reliable detection of small pattern defects such as bridge, burr, pinch, and contamination.
By Pangyun Jeong, Jiyeong Kong, Yuehua Hu, Dohee Jeong, Kyung-Tae Kang