LithoWorld is an endpoint world model designed to recover lithography process parameters using scanning electron microscopy (SEM) guidance. It jointly uses interior representative targets to define qualified reference appearances and correction supervision, aligning current image features with endpoint representations via a causal predictive branch and generating two‑dimensional corrections through a conditional flow policy. Trained on 173 groups of measured SEMs, the model achieves 88.5% qualified‑region success and 46.0% interior success on a 200‑pair test set, outperforming the best comparison method by 2.5 and 6.0 percentage points, respectively.
arXiv:2606. 26713v1 Announce Type: new Abstract: As semiconductor technology nodes scale, computational lithography is essential for ensuring yield and performance.
arXiv:2606.24817v3 Announce Type: replace Abstract: Advanced semiconductor nodes drastically increased demand for Transmission Electron Microscopy (TEM), yet destructive sample preparation, slow imag...
arXiv:2606. 29592v1 Announce Type: new Abstract: A central premise of autonomous scientific imaging is that smarter navigation, whether Bayesian, RL-based, or otherwise adaptive, is the principal lever for sample-efficient acquisition.
arXiv:2606. 08908v1 Announce Type: cross Abstract: Semiconductor lithography inspection requires reliable detection of small pattern defects such as bridge, burr, pinch, and contamination.
A central premise of autonomous scientific imaging is that smarter navigation, whether Bayesian, RL-based, or otherwise adaptive, is the principal lever for sample-efficient acquisition. We present evidence to the contrary in scanning transmission electron microscopy (STEM), an atomic-resolution imaging modality whose every measurement deposits damaging electron dose.
arXiv:2606. 00228v1 Announce Type: new Abstract: In semiconductor manufacturing, lithography projects circuit layouts onto silicon wafers through an optical mask.
arXiv:2609.21593v1 Announce Type: new Abstract: Four-dimensional scanning transmission electron microscopy (4D-STEM) records a two-dimensional diffraction pattern at each electron-probe position, yie...
arXiv:2608. 11868v1 Announce Type: new Abstract: The customization, optimization and stabilization of the process flow of a silicon bipolar phototransistor commits months of cleanroom time before a finished device can be measured, so a model that predicts device gain from process parameters before a run has value out of proportion to its accuracy.
arXiv:2609.27621v1 Announce Type: new Abstract: Physical modeling and inverse design require computation that can continue from reusable state. We introduce SHRAV, an architecture-independent computa...
arXiv:2604. 26633v2 Announce Type: replace-cross Abstract: Industrial surface defect inspection suffers from a fundamental data bottleneck: defects are rare, annotations require expert knowledge, and collecting balanced training sets is slow and costly.
The paper introduces a certified abstention approach for image registration, distinguishing between recoverable and provably-unidentifiable regions in reference-perturbed sampled imaging. It establishes a resolution threshold that separates these regimes and provides a framework that exactly recovers identifiable areas while abstaining from unreliable ones, avoiding hallucinated structures. Experiments on scanning, rolling‑shutter, and cryo‑electron‑microscopy systems confirm that the method abstains where classical or learned estimators fabricate artifacts.
The paper introduces a framework for auditing image editors that can satisfy regional plausibility constraints while lacking a single latent explanation for the entire output. It defines a common witness grade and witness nerve to formalize local-to-global failures, separating auditing from causal identification. Using Helly-type arguments and a blocker-hypergraph formula, the authors provide short incompatibility certificates, sharp partial-identification bounds for specified image features, and finite-sample outer coverage of identified intervals, validated through controlled MNIST, Morpho-MNIST, and smallNORB experiments.