arXiv Machine Learning August 13, 2026 By Mahshid Amirabgir, Lorenza Ferrario, Paolo Conci, Mahdieh Amirabgir, Giancarlo Orengo

Forward and Inverse Virtual Metrology for Phototransistor Gain: A Hierarchical, Uncertainty-Aware Approach for Small Production Datasets

Read the original on arXiv Machine Learning →

arXiv:2608. 11868v1 Announce Type: new Abstract: The customization, optimization and stabilization of the process flow of a silicon bipolar phototransistor commits months of cleanroom time before a finished device can be measured, so a model that predicts device gain from process parameters before a run has value out of proportion to its accuracy.

Summary generated by The Flow from the publisher's feed. The full article lives at arXiv Machine Learning.

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