LithoGRPO: Fast Inverse Lithography via GRPO Reinforced Flow Matching
arXiv:2606. 00228v1 Announce Type: new Abstract: In semiconductor manufacturing, lithography projects circuit layouts onto silicon wafers through an optical mask.
arXiv:2608. 11868v1 Announce Type: new Abstract: The customization, optimization and stabilization of the process flow of a silicon bipolar phototransistor commits months of cleanroom time before a finished device can be measured, so a model that predicts device gain from process parameters before a run has value out of proportion to its accuracy.
arXiv:2606. 00228v1 Announce Type: new Abstract: In semiconductor manufacturing, lithography projects circuit layouts onto silicon wafers through an optical mask.
arXiv:2606. 26713v1 Announce Type: new Abstract: As semiconductor technology nodes scale, computational lithography is essential for ensuring yield and performance.
arXiv:2606. 11247v1 Announce Type: cross Abstract: Generative models are increasingly used to propose designs, data, and control actions for physical systems, yet many such systems are governed by hard physical constraints rather than by perceptual plausibility.
arXiv:2603. 15925v2 Announce Type: replace Abstract: Inverse design aims to find design parameters $x$ achieving target performance $y^*$.
arXiv:2606. 04850v1 Announce Type: cross Abstract: Designing a neural network processor is an end-to-end co-design problem: network architecture and training budget determine the inference workload; hardware mapping decisions determine chip area, latency, and energy; and these characteristics govern fabrication yield and manufacturing cost.
arXiv:2607. 23469v1 Announce Type: cross Abstract: Photonic-crystal surface-emitting lasers (PCSELs) can combine high-power operation with narrow-divergence surface emission, but optimizing coupled parameters requires costly full-wave simulations.
arXiv:2606. 11574v1 Announce Type: new Abstract: In many materials and product design problems, desirable candidates exhibit properties that fall within an acceptable range rather than achieve a single optimum.
arXiv:2607. 12104v1 Announce Type: cross Abstract: Machine learning models for system diagnostics rely on kernel execution traces to capture fine-grained system behavior, but collecting production traces in industrial systems is costly due to runtime overhead, storage demands, and privacy constraints.
arXiv:2607. 03193v1 Announce Type: cross Abstract: Calibrating a superconducting transmon chip is a sequential decision problem under noise, drift, and a finite budget: an expert must choose experiments, read ambiguous plots, judge fit quality, and revise stale beliefs as the chip drifts.
arXiv:2608. 10398v1 Announce Type: cross Abstract: Variational autoencoders generate samples from probabilistic latent representations but do not distinguish uncertainty about the latent location from variability around it.
arXiv:2607. 07863v1 Announce Type: new Abstract: In physically dominated machining processes, experimental datasets are small, expensive, and material-specific; in this regime, data curation, evaluation design, and the form of physics integration can matter as much as the learning algorithm.
arXiv:2606. 26383v1 Announce Type: cross Abstract: How fast could a deep-learning model run on target hardware, and how far is today's implementation from that limit?