arXiv:2606. 26713v1 Announce Type: new Abstract: As semiconductor technology nodes scale, computational lithography is essential for ensuring yield and performance.
Summary generated by The Flow from the publisher's feed. The full article lives at arXiv AI.
arXiv:2606. 00228v1 Announce Type: new Abstract: In semiconductor manufacturing, lithography projects circuit layouts onto silicon wafers through an optical mask.
arXiv:2606. 11247v1 Announce Type: cross Abstract: Generative models are increasingly used to propose designs, data, and control actions for physical systems, yet many such systems are governed by hard physical constraints rather than by perceptual plausibility.
arXiv:2607. 15560v1 Announce Type: cross Abstract: Physics-informed neural networks (PINNs) are unusually sensitive to interacting choices of architecture, activation, loss weighting, collocation, optimization, and constraint enforcement.
arXiv:2607. 23469v1 Announce Type: cross Abstract: Photonic-crystal surface-emitting lasers (PCSELs) can combine high-power operation with narrow-divergence surface emission, but optimizing coupled parameters requires costly full-wave simulations.
arXiv:2607. 07682v1 Announce Type: new Abstract: The inverse design of physical systems governed by partial differential equations is computationally demanding due to the high dimensionality and non-convexity of design spaces.
arXiv:2502. 08006v3 Announce Type: replace-cross Abstract: Training-free guided generation is a widely used and powerful technique that allows the end user to exert further control over the generative process of flow/diffusion models.