arXiv:2606. 00228v1 Announce Type: new Abstract: In semiconductor manufacturing, lithography projects circuit layouts onto silicon wafers through an optical mask.
Summary generated by The Flow from the publisher's feed. The full article lives at arXiv Machine Learning.
arXiv:2606. 26713v1 Announce Type: new Abstract: As semiconductor technology nodes scale, computational lithography is essential for ensuring yield and performance.
arXiv:2604. 23658v2 Announce Type: replace-cross Abstract: Chip placement plays an important role in physical design.
arXiv:2603. 15925v2 Announce Type: replace Abstract: Inverse design aims to find design parameters $x$ achieving target performance $y^*$.
arXiv:2606. 11247v1 Announce Type: cross Abstract: Generative models are increasingly used to propose designs, data, and control actions for physical systems, yet many such systems are governed by hard physical constraints rather than by perceptual plausibility.
arXiv:2601. 23231v2 Announce Type: replace-cross Abstract: Flow-based generative models provide strong unconditional priors for inverse problems, but guiding their dynamics for conditional generation remains challenging.
arXiv:2608. 11868v1 Announce Type: new Abstract: The customization, optimization and stabilization of the process flow of a silicon bipolar phototransistor commits months of cleanroom time before a finished device can be measured, so a model that predicts device gain from process parameters before a run has value out of proportion to its accuracy.