arXiv Machine Learning

From Processing to Functionality: Engineering Accessible Material States in Cu-Embedded SiO$_x$ Memristive Devices

The paper develops a multiscale framework linking plasma deposition conditions to the functionality of sputtered SiO$_x$/Cu/SiO$_x$ memristive devices. By analyzing over 50,000 devices and combining plasma and atomistic simulations, it shows that device behavior arises from a probabilistic cascade of defect formation, evolution, and functional regime emergence, rather than deterministic mappings. A latent descriptor based on reconstructed oxygen‑vacancy density captures the combined effects of structural disorder and defect topology, linking hidden material properties to observable electrical responses and explaining variability in large‑area devices.

arXiv Machine Learning
Sep 4

Physics-Informed Neural Network Surrogate for Oxygen Vacancy Dynamics in epitaxial $\mathrm{SrTiO_3}$ on Si memristors via Dynamic Spectral Optimization

Physics-informed neural networks (PINNs) are applied to model ion‑electronic drift‑diffusion in Pt/SrTiO₃/Si memristive heterostructures, overcoming numerical stiffness and multiscale spatial challenges. A cascaded PINN architecture with a custom Chebyshev spectral optimizer (DSO V2 Hybrid) isolates potential, carrier density, and vacancy transport into four sequential sub‑networks, avoiding condition numbers above 10¹⁶. The surrogate reproduces experimental conductive‑AFM current‑voltage hysteresis with R² > 0.96, maintains Poisson consistency, and offers differentiable inverse parameter estimation and linear‑time inference compared to conventional finite‑element solvers.

By Rodion Podorozhny, Nikoleta Theodoropoulou, Jelena Te\v{s}i\'c
arXiv Machine Learning
Sep 10

Atomistic Modeling of Chemical Disorder in Materials: Bridging Conventional Methods and AI-Assisted Approaches

The article reviews strategies for modeling chemical disorder in materials, addressing the gap between experimental descriptions of disorder and the detailed configurations required for atomistic simulations and AI workflows. It evaluates traditional approaches such as mean-field theories, cluster expansion, and Monte Carlo, alongside emerging AI-powered methods like universal interatomic potentials and generative models. The review also discusses how AI can accelerate computational schemes and enable disorder-native capabilities, providing a roadmap for integrating disorder into realistic AI-accelerated materials discovery.

By Jiayu Peng, Peichen Zhong
arXiv AI
4d ago

AtomWorld-Mem: Memory-Restored World States for Long-Horizon Atomistic Evolution

AtomWorld-Mem is a memory‑restored atomistic world model that reconstructs hidden world states from incomplete crystal snapshots, enabling more accurate long‑horizon atomistic evolution. It uses spatial encoders to capture multi‑scale keyframes and integrates short‑term event memory with long‑term structural memory to predict future states. The restored state guides vacancy‑mediated events in kinetic Monte Carlo simulations, improving progress under fixed event budgets while preserving fidelity across energetic, structural, and transport observables, and it transfers zero‑shot across unseen alloy‑temperature scenarios.

By Tian Luo, Ruge Zhang, Haozhi Han, Yifrng Chen, Yunquan Zhang, Yunxin Liu, Ting Cao, Kun Li
arXiv Machine Learning
Jul 7

SMART: A Machine Learning and Monte Carlo Framework for Rapid Analysis of Stochastic Transistor Aging and Process Variation in Digital Circuits

arXiv:2607. 05187v1 Announce Type: new Abstract: As CMOS technology scales into the deep nanometer regime, digital circuit reliability is increasingly threatened by the combined stochastic effects of Bias Temperature Instability (BTI) and Process Variation (PV).

By Arash Esshaghi, Siavash Es'haghi, Gholamreza Shahabadi, Alireza Moradi
arXiv Machine Learning
Sep 15

Prescreening Point Defects in Semiconductors With Machine Learning

The paper presents physics‑guided machine‑learning models that predict defect formation energies and zero‑phonon lines (ZPLs) for point defects in semiconductors, aiming to replace costly density‑functional theory (DFT) calculations in the prescreening stage of high‑throughput workflows. Using ridge, kernel ridge, and multilayer perceptron models with three descriptors, the authors achieve mean absolute errors of 0.437 eV for formation energies and 0.202 eV for ZPLs on vacancies and substitutions in 4H‑SiC, while interstitials show larger errors (1.101 eV and 0.230 eV). These results demonstrate that the models can effectively accelerate defect screening, potentially obviating the need for expensive DFT relaxations in many cases.

By Paul Karlsson, Joel Davidsson, Rickard Armiento
arXiv Machine Learning
Sep 14

Agentic TCAD Calibration Workflow for Oxide Semiconductor Transistors

The article presents the first demonstration of an agentic TCAD calibration workflow for a fabricated bottom‑gate In–W–O transistor. Starting from measured transfer curves, the workflow uses measurement–TCAD residuals and local sensitivity tests to guide parameter corrections or additional physical models, accepting only updates that improve device metrics. For a 2%‑W reference device, five agent‑suggested updates reduced the multi‑metric device objective by 14.3× and achieved low errors in threshold voltage and on‑current across varying bias and geometry, showing model transferability and process sensitivity.

By Gyujun Jeong, Junmo Lee, Sungwon Cho, Woohyun Hwang, Kwangyou Seo, Suhwan Lim, Wanki Kim, Daewon Ha, Rishi Ranade, Kihang Youn, Ram Cherukuri, Yiyi Wang, Asif Khan, Shimeng Yu
arXiv Machine Learning
Sep 4

Mesh-Native Physics-Informed Graph Surrogates for TCAD-in-the-Loop Design Space Exploration

The paper introduces a physics‑informed graph attention network that directly operates on the tetrahedral mesh used in TCAD simulations of FinFET devices. By predicting electrostatic potential and quasi‑Fermi levels at every mesh node and training with both data loss and finite‑volume current‑continuity residuals, the surrogate retains the underlying carrier‑transport physics while achieving size generalization. Benchmarks against Sentaurus Device show sub‑volt RMSE for the drift‑diffusion fields and a per‑design throughput that is orders of magnitude faster, enabling rapid Pareto‑front exploration of large multi‑fin arrays that would otherwise be prohibitively slow to simulate.

By Leonid Popryho, Ayoub Sadeghi, Inna Partin-Vaisband
Hugging Face Trending Papers
Jul 6

SMART: A Machine Learning and Monte Carlo Framework for Rapid Analysis of Stochastic Transistor Aging and Process Variation in Digital Circuits

As CMOS technology scales into the deep nanometer regime, digital circuit reliability is increasingly threatened by the combined stochastic effects of Bias Temperature Instability (BTI) and Process Variation (PV). Traditional reliability analysis methods, which rely on computationally intensive simulations or extensive lookup tables, fail to scale efficiently for large designs, creating a critical bottleneck in design space exploration.

arXiv Machine Learning
Aug 11

Physics-Informed Condition Monitoring of SiC Power Modules

arXiv:2608. 08363v1 Announce Type: cross Abstract: Silicon carbide (SiC) power modules are increasingly deployed in automotive traction inverters, where condition monitoring is essential to prevent in-service failures.

By Mattia Scarpa, Evgeny Kusmenko, Francesco Toso, Mattia Bruschetta, Ruggero Carli, Simon Achatz