LithoWorld: An Endpoint World Model for Lithography Process-Window Recovery
Read the original on arXiv Computer Vision →LithoWorld is an endpoint world model designed to recover lithography process parameters using scanning electron microscopy (SEM) guidance. It jointly uses interior representative targets to define qualified reference appearances and correction supervision, aligning current image features with endpoint representations via a causal predictive branch and generating two‑dimensional corrections through a conditional flow policy. Trained on 173 groups of measured SEMs, the model achieves 88.5% qualified‑region success and 46.0% interior success on a 200‑pair test set, outperforming the best comparison method by 2.5 and 6.0 percentage points, respectively.
Machine-generated by The Flow from the publisher's headline and feed description — not written or checked by a human. The full article lives at arXiv Computer Vision.