arXiv:2607. 27065v2 Announce Type: cross Abstract: While automated defect detection such as the detection of surface scratched is an important aspect in industrial quality control, the scarcity of annotated defect data make this task challenging.
By Paul Julius K\"uhn, Saptarshi Neil Sinha, Tiago Kleist, Richard Hoffmann, Arjan kuijper, Michael Weinmann
arXiv:2604. 26633v2 Announce Type: replace-cross Abstract: Industrial surface defect inspection suffers from a fundamental data bottleneck: defects are rare, annotations require expert knowledge, and collecting balanced training sets is slow and costly.
By Paul Julius K\"uhn, Mika Pommeranz, Arjan Kuijper, Saptarshi Neil Sinha
This paper presents the IEEE International Conference on Multimedia and Expo (ICME) 2026 Grand Challenge on Cross-Scenario Defect Detection and Fine-Grained Severity Grading for High-Precision Manufacturing. The challenge is motivated by two key limitations of existing industrial defect inspection systems: (1) current deep learning-based methods often suffer significant performance degradation when deployed in unseen production scenarios, and (2) most benchmarks neglect severity-aware assessment, which is critical for risk control and yield optimization.
arXiv:2606. 01023v1 Announce Type: cross Abstract: Visual inspection remains the dominant quality-control practice in woven and tufted carpet production, yet it is slow, subjective, and inconsistent at the line speeds and widths of modern looms.
By Akbar Erkinov
arXiv:2608. 13937v1 Announce Type: cross Abstract: Smart manufacturing processes are often installed with a large number of sensors, imaging devices and computers, which not only enable instant communication across various modules of a production system but also aid in intelligent manufacturing management.
By Yicheng Kang, Yuling Jiao, Xin Geng, Mahesh Nagarajan
arXiv:2606. 00852v1 Announce Type: cross Abstract: Printed circuit board (PCB) defect detection is challenging because many defects are small and difficult to distinguish from complex background patterns.
By Vinay Edula, Nilesh Badwe, Priyanka Bagade