arXiv Machine Learning By Tobias Gergs, Rouven Lamprecht, Sahitya Yarragolla, Ole Gronenberg, Luca Vialetto, Hermann Kohlstedt, Thomas Mussenbrock, Jan Trieschmann

From Processing to Functionality: Engineering Accessible Material States in Cu-Embedded SiO$_x$ Memristive Devices

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The paper develops a multiscale framework linking plasma deposition conditions to the functionality of sputtered SiO$_x$/Cu/SiO$_x$ memristive devices. By analyzing over 50,000 devices and combining plasma and atomistic simulations, it shows that device behavior arises from a probabilistic cascade of defect formation, evolution, and functional regime emergence, rather than deterministic mappings. A latent descriptor based on reconstructed oxygen‑vacancy density captures the combined effects of structural disorder and defect topology, linking hidden material properties to observable electrical responses and explaining variability in large‑area devices.

Machine-generated by The Flow from the publisher's headline and feed description — not written or checked by a human. The full article lives at arXiv Machine Learning.

arXiv Machine Learning
Sep 4

Physics-Informed Neural Network Surrogate for Oxygen Vacancy Dynamics in epitaxial $\mathrm{SrTiO_3}$ on Si memristors via Dynamic Spectral Optimization

Physics-informed neural networks (PINNs) are applied to model ion‑electronic drift‑diffusion in Pt/SrTiO₃/Si memristive heterostructures, overcoming numerical stiffness and multiscale spatial challenges. A cascaded PINN architecture with a custom Chebyshev spectral optimizer (DSO V2 Hybrid) isolates potential, carrier density, and vacancy transport into four sequential sub‑networks, avoiding condition numbers above 10¹⁶. The surrogate reproduces experimental conductive‑AFM current‑voltage hysteresis with R² > 0.96, maintains Poisson consistency, and offers differentiable inverse parameter estimation and linear‑time inference compared to conventional finite‑element solvers.

By Rodion Podorozhny, Nikoleta Theodoropoulou, Jelena Te\v{s}i\'c
arXiv Machine Learning
Sep 10

Atomistic Modeling of Chemical Disorder in Materials: Bridging Conventional Methods and AI-Assisted Approaches

The article reviews strategies for modeling chemical disorder in materials, addressing the gap between experimental descriptions of disorder and the detailed configurations required for atomistic simulations and AI workflows. It evaluates traditional approaches such as mean-field theories, cluster expansion, and Monte Carlo, alongside emerging AI-powered methods like universal interatomic potentials and generative models. The review also discusses how AI can accelerate computational schemes and enable disorder-native capabilities, providing a roadmap for integrating disorder into realistic AI-accelerated materials discovery.

By Jiayu Peng, Peichen Zhong
arXiv AI
4d ago

AtomWorld-Mem: Memory-Restored World States for Long-Horizon Atomistic Evolution

AtomWorld-Mem is a memory‑restored atomistic world model that reconstructs hidden world states from incomplete crystal snapshots, enabling more accurate long‑horizon atomistic evolution. It uses spatial encoders to capture multi‑scale keyframes and integrates short‑term event memory with long‑term structural memory to predict future states. The restored state guides vacancy‑mediated events in kinetic Monte Carlo simulations, improving progress under fixed event budgets while preserving fidelity across energetic, structural, and transport observables, and it transfers zero‑shot across unseen alloy‑temperature scenarios.

By Tian Luo, Ruge Zhang, Haozhi Han, Yifrng Chen, Yunquan Zhang, Yunxin Liu, Ting Cao, Kun Li
arXiv Machine Learning
Jul 7

SMART: A Machine Learning and Monte Carlo Framework for Rapid Analysis of Stochastic Transistor Aging and Process Variation in Digital Circuits

arXiv:2607. 05187v1 Announce Type: new Abstract: As CMOS technology scales into the deep nanometer regime, digital circuit reliability is increasingly threatened by the combined stochastic effects of Bias Temperature Instability (BTI) and Process Variation (PV).

By Arash Esshaghi, Siavash Es'haghi, Gholamreza Shahabadi, Alireza Moradi
arXiv Machine Learning
Sep 15

Prescreening Point Defects in Semiconductors With Machine Learning

The paper presents physics‑guided machine‑learning models that predict defect formation energies and zero‑phonon lines (ZPLs) for point defects in semiconductors, aiming to replace costly density‑functional theory (DFT) calculations in the prescreening stage of high‑throughput workflows. Using ridge, kernel ridge, and multilayer perceptron models with three descriptors, the authors achieve mean absolute errors of 0.437 eV for formation energies and 0.202 eV for ZPLs on vacancies and substitutions in 4H‑SiC, while interstitials show larger errors (1.101 eV and 0.230 eV). These results demonstrate that the models can effectively accelerate defect screening, potentially obviating the need for expensive DFT relaxations in many cases.

By Paul Karlsson, Joel Davidsson, Rickard Armiento