arXiv:2606. 00228v1 Announce Type: new Abstract: In semiconductor manufacturing, lithography projects circuit layouts onto silicon wafers through an optical mask.
By Yao Lai, Xuyuan Xiong, Zeyue Xue, Guojin Chen, Jing Wang, Xihui Liu, Rui Zhang, Robert Mullins, Bei Yu, Ping Luo
arXiv:2602. 08406v2 Announce Type: replace-cross Abstract: The prediction of electromagnetic spectra for MXene-based solar absorbers, where MXenes are a family of two-dimensional transition metal carbides and nitrides, is a computationally intensive task traditionally addressed using full-wave solvers.
By Shujaat Khan, Waleed Iqbal Waseer, Muhammad Shahid Jabbar
arXiv:2603. 15925v2 Announce Type: replace Abstract: Inverse design aims to find design parameters $x$ achieving target performance $y^*$.
By Miguel de Campos, Werner Krebs, Hanno Gottschalk
arXiv:2608. 11860v1 Announce Type: cross Abstract: Data-driven inverse design enables efficient generation of nanophotonic structures with prescribed optical responses, but spectrum-to-geometry mapping remains challenging due to non-uniqueness and fine geometric features.
By Waleed Waseer, Muhammad Shahid Jabbar, Muhammad Sohail Ibrahim, Shujaat Khan
arXiv:2608. 14702v1 Announce Type: cross Abstract: Film emulation reproduces the look of an analog film stock on a new digital photograph.
By Yitong Mu
arXiv:2604. 02429v2 Announce Type: replace-cross Abstract: Convolutional neural networks (CNNs) have transformed image processing, but the energy consumption and inference latency of electronic based implementations remain fundamental bottlenecks.
By Saurabh Ranjan, Sonika Thakral, Amit Sehgal