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arXiv Machine Learning By Vasiliy A. Es'kin, Egor V. Ivanov, Olga V. Martynova

A Two-Mirror Faceted Projection System for EUV Lithography

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The paper proposes an all‑reflective two‑mirror projection system for EUV lithography that achieves a 4× demagnification at a numerical aperture close to unity (NA≈0.993). Unlike conventional EUV objectives that use 6–10 aspheric mirrors and have <15 % throughput, the design uses a fixed two‑reflection path for each accepted diffraction order, retaining 50–60 % of the power and eliminating order‑dependent phase shifts. The authors optimize 30‑bilayer Bragg coatings for each mirror facet, formulate a 3‑D vector model for a two‑dimensionally periodic mask, and use inverse lithography with a differentiable modal solver to demonstrate simulated sub‑10‑nm aerial images with resolved peaks up to 5 nm defocus.

Machine-generated by The Flow from the publisher's headline and feed description — not written or checked by a human. The full article lives at arXiv Machine Learning.

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