arXiv AI By Aman Mehta

The Refusal Residue: When Probes Catch Alignment Faking and When They Don't

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arXiv:2607. 13346v1 Announce Type: cross Abstract: Alignment faking is dangerous because a model can appear compliant under monitoring while preserving behavior it would reveal when unmonitored.

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arXiv Machine Learning
Jul 31

Exposure is not manifestation: measurement target and output resolution jointly determine which behavioural-faithfulness evaluator wins

arXiv:2607. 09306v3 Announce Type: replace-cross Abstract: Behavioural auditing asks whether a language model behaves as it claims, but detection scores are reported without separating two targets: whether a reply was produced under a behaviour-inducing condition (exposure) and whether the behaviour surfaced in it (manifestation).

By Kwan Soo Shin